It's assumed that occasionally, secondary thermal ALD reactions via the gaseous by-products and solutions can result in an seemingly superior conformality than could be reached with a “pure” plasma process. As an illustration, experimental film thickness profiles attained for PE-ALD of Al2O3 by Dendooven et al. As now talked about https://atomic-layer-deposition61470.mdkblog.com/24716345/5-simple-statements-about-atomic-layer-deposition-explained